32 nm process
id:
32-nm-process-254-15437961
title:
32 nm process
text:
The "32 nm" node is the step following the "45 nm" process in CMOS (MOSFET) semiconductor device fabrication. "32-nanometre" refers to the average half-pitch of a memory cell at this technology level. Toshiba produced commercial 32 GiB NAND flash memory chips with the "32 nm" process in 2009. Intel and AMD produced commercial microchips using the "32 nm" process in the early 2010s. IBM and the Common Platform also developed a "32 nm" high-κ metal gate process. Intel began selling its first "32 n
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wiki
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encyclopedia
description:
original url:
https://en.wikipedia.org/wiki/32_nm_process
date created:
date modified:
2024-04-25T22:04:57Z
main entity:
{"identifier":"Q2652244","url":"https://www.wikidata.org/entity/Q2652244"}
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13
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