SU-8 photoresist
id:
su-8-photoresist-182-448032
title:
SU-8 photoresist
text:
SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety. It is these epoxies that cross-link to give the final structure. It can be made into a viscous polymer that can be spun or sprea
brand slug:
wiki
category slug:
encyclopedia
description:
Epoxy-based polymer
original url:
https://en.wikipedia.org/wiki/SU-8_photoresist
date created:
2006-01-17T23:43:28Z
date modified:
2024-09-06T12:28:29Z
main entity:
{"identifier":"Q1413635","url":"https://www.wikidata.org/entity/Q1413635"}
image:
{"content_url":"https://upload.wikimedia.org/wikipedia/commons/8/8c/SU-8_photoresist.png","width":689,"height":565}
fields total:
13
integrity:
16