Piranha solution

id: piranha-solution-203-8879216
title: Piranha solution
text: Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most surfaces, making them highly hydrophilic (water-compatible). This means the solution can also easily dissolve fabric and skin, potentially causing severe damage and
brand slug: wiki
category slug: encyclopedia
description: Oxidizing acid mixture containing sulfuric acid and hydrogen peroxide
original url: https://en.wikipedia.org/wiki/Piranha_solution
date created: 2005-10-20T16:17:39Z
date modified: 2024-09-09T16:29:47Z
main entity: {"identifier":"Q2552875","url":"https://www.wikidata.org/entity/Q2552875"}
image: {"content_url":"https://upload.wikimedia.org/wikipedia/commons/3/30/The_Piranha_Solution.png","width":955,"height":783}
fields total: 13
integrity: 16

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