Ion plating
id:
ion-plating-278-14143044
title:
Ion plating
text:
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the de
brand slug:
wiki
category slug:
encyclopedia
description:
Method of coating solid surfaces with ions
original url:
https://en.wikipedia.org/wiki/Ion_plating
date created:
date modified:
2024-03-23T19:24:52Z
main entity:
{"identifier":"Q899143","url":"https://www.wikidata.org/entity/Q899143"}
image:
{"content_url":"https://upload.wikimedia.org/wikipedia/commons/f/f1/ION_PLATING_RIG_-_NARA_-_17418910.jpg","width":6152,"height":4885}
fields total:
13
integrity:
15