Ion layer gas reaction
id:
ion-layer-gas-reaction-278-17743997
title:
Ion layer gas reaction
text:
Ion layer gas reaction (ILGAR®) is a non-vacuum, thin-film deposition technique developed and patented by the group of Professor Dr. Christian-Herbert Fischer at the Helmholtz-Zentrum Berlin for materials and energy in Berlin, Germany. It is a sequential and cyclic process that enables the deposition of semiconductor thin films, mainly for photovoltaic applications, specially chalcopyrite absorber layers and buffer layers. The ILGAR technique was awarded as German High Tech Champion 2011 by the
brand slug:
wiki
category slug:
encyclopedia
description:
original url:
https://en.wikipedia.org/wiki/Ion_layer_gas_reaction
date created:
date modified:
2022-03-10T10:19:02Z
main entity:
{"identifier":"Q4202783","url":"https://www.wikidata.org/entity/Q4202783"}
image:
{"content_url":"https://upload.wikimedia.org/wikipedia/commons/5/55/ILGAR_Steps.jpg","width":806,"height":467}
fields total:
13
integrity:
14