Ion beam-assisted deposition
id:
ion-beam-assisted-deposition-194-314167
title:
Ion beam-assisted deposition
text:
Ion beam assisted deposition is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing independent control of parameters such as ion energy, temperature and arrival rate of atomic species during deposition, this technique is especially useful to create a gradual transition between the substrate material and the deposited film, and for depositing films with less built-in strain than is possib
brand slug:
wiki
category slug:
encyclopedia
description:
Materials engineering technique
original url:
https://en.wikipedia.org/wiki/Ion_beam-assisted_deposition
date created:
date modified:
2024-02-05T19:59:13Z
main entity:
{"identifier":"Q904053","url":"https://www.wikidata.org/entity/Q904053"}
image:
fields total:
13
integrity:
14