Hybrid physical–chemical vapor deposition
id:
hybrid-physical-chemical-vapor-deposition-299-10437335
title:
Hybrid physical–chemical vapor deposition
text:
Hybrid physical–chemical vapor deposition (HPCVD) is a thin-film deposition technique, that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin-film growth, HPCVD process uses diborane (B2H6) as the boron precursor gas, but unlike conventional CVD, which only uses gaseous sources, heated bulk magnesium pellets (99.95% pure) are used as the Mg source in the deposition process. Since the process involves chemical decompo
brand slug:
wiki
category slug:
encyclopedia
description:
Thin-film deposition technique
original url:
https://en.wikipedia.org/wiki/Hybrid_physical%E2%80%93chemical_vapor_deposition
date created:
date modified:
2022-10-08T08:54:58Z
main entity:
{"identifier":"Q5953272","url":"https://www.wikidata.org/entity/Q5953272"}
image:
{"content_url":"https://upload.wikimedia.org/wikipedia/en/d/d4/HPCVD_chamber.JPG","width":1536,"height":2048}
fields total:
13
integrity:
15