Hafnium(IV) silicate
id:
hafnium-iv-silicate-266-483844
title:
Hafnium(IV) silicate
text:
Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4. Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor devices. The addition of silicon to hafnium oxide increases the band gap, while decreasing the dielectric constant. Furthermore, it increases the crystallization temperature of amorphous
brand slug:
wiki
category slug:
encyclopedia
description:
Chemical compound
original url:
https://en.wikipedia.org/wiki/Hafnium(IV)_silicate
date created:
date modified:
2024-04-05T20:14:25Z
main entity:
{"identifier":"Q5638412","url":"https://www.wikidata.org/entity/Q5638412"}
image:
fields total:
13
integrity:
14