Extreme ultraviolet lithography
id:
extreme-ultraviolet-lithography-182-5924335
title:
Extreme ultraviolet lithography
text:
Extreme ultraviolet lithography is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses extreme ultraviolet (EUV) light to create intricate patterns on silicon wafers. As of 2023, ASML Holding is the only company that produces and sells EUV systems for chip production, targeting 5 nanometer (nm) and 3 nm process nodes. The EUV wavelengths that are used in EUVL are near 13.5 nanometers (nm), using a laser-pulsed ti
brand slug:
wiki
category slug:
encyclopedia
description:
Lithography using 13.5 nm UV light
original url:
https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography
date created:
2005-07-02T04:44:27Z
date modified:
2024-09-06T04:54:52Z
main entity:
{"identifier":"Q371965","url":"https://www.wikidata.org/entity/Q371965"}
image:
{"content_url":"https://upload.wikimedia.org/wikipedia/commons/c/cd/EUV_photoelectrons_and_secondaries_%28vector%29.svg","width":249,"height":153}
fields total:
13
integrity:
16