Dry etching
id:
dry-etching-315-16046585
title:
Dry etching
text:
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions that dislodge portions of the material from the exposed surface. A common type of dry etching is reactive-ion etching. Unlike with many of the wet chemical etchants used in wet etching, the dry etching process typically etches directionally or anisotropically.
brand slug:
wiki
category slug:
encyclopedia
description:
Controlled material removal, without the use of liquid substances
original url:
https://en.wikipedia.org/wiki/Dry_etching
date created:
date modified:
2023-10-19T05:26:08Z
main entity:
{"identifier":"Q1191918","url":"https://www.wikidata.org/entity/Q1191918"}
image:
fields total:
13
integrity:
14