Chemical vapor deposition of ruthenium
id:
chemical-vapor-deposition-of-ruthenium-285-16552138
title:
Chemical vapor deposition of ruthenium
text:
Chemical vapor deposition of ruthenium is a method to deposit thin layers of ruthenium on substrates by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity-free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C–H and C–C bonds, that aids C–H and C–C bond scission. This creates a potential catalytic decomposition path for all metal-organic CVD precursors that is likely to lead to significant carbon incorporation. Platinum, a chem
brand slug:
wiki
category slug:
encyclopedia
description:
Methods of adding ruthenium on a substrate material
original url:
https://en.wikipedia.org/wiki/Chemical_vapor_deposition_of_ruthenium
date created:
date modified:
2023-11-17T07:48:34Z
main entity:
{"identifier":"Q5090506","url":"https://www.wikidata.org/entity/Q5090506"}
image:
fields total:
13
integrity:
14