Atomic layer etching
id:
atomic-layer-etching-191-4034399
title:
Atomic layer etching
text:
Atomic layer etching (ALE) is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical modification steps which affect only the top atomic layers of the wafer, and etching steps which remove only the chemically-modified areas, allows the removal of individual atomic layers. The standard example is etching of silicon by alternating reaction with chlorine and etching with argon ions. This is a better-controlled process than reactive ion etc
brand slug:
wiki
category slug:
encyclopedia
description:
Method that removes material, one 1-atom thick layer at a time
original url:
https://en.wikipedia.org/wiki/Atomic_layer_etching
date created:
date modified:
2023-08-23T20:33:21Z
main entity:
{"identifier":"Q25052458","url":"https://www.wikidata.org/entity/Q25052458"}
image:
fields total:
13
integrity:
14